Abstract
A composite alumina (α-Al2O3) or iron powder which is coated with a homogeneous titanium nitride (TiN) thin film, was prepared by the rotary powder bed chemical vapor deposition (CVD) in the TiCl4-N2H2 reactant system. The dispersibility of coated powders and kinetics of the rotary powder bed CVD were investigated by varying important parameters such as the onset temperature of reactant gas introduction, the rotary speed of specimen cell, the grain size and charge amount. of powder. The adsorption pretreatment of the reactant gas on to rotating particles during raising temperature from 300°C to the deposition temperature was required to improve the particle dispersibility. No transition temperature from reactionto diffusion-limited regions for TiN deposition was observed in this CVD system. The deposition rate was inversely proportional to the total surface area of powder.
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