Abstract
We fabricated magnetic rectangular block arrays of 130 and 260 Gblock/in2 by using focused ion beam lithography. The ratios R of the total block area to the array area are 0.73 and 0.64, respectively. The magnetic domain boundaries of the arrays run along the grooves between the blocks. Each block has a single domain structure and perpendicular magnetic anisotropy. The pattening increased the squareness from 0.2 of the continuous film to 0.87 of the array with 130 Gblock/in2. Application of the block arrays to high-density patterned magnetic recording media is discussed.
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