Abstract
Diamond like carbon (DLC) and silicon containing DLC (Si-DLC) films were deposited by EBEP (electron beam excited plasma)-CVD. The effects of CF4 plasma treatment and Si-inclusion on DLC film on surface energy, nanoindentation hardness and nanoscratching properties were investigated. DLC and Si-DLC films were surface modified by CF4 plasma treatment. CF4 plasma treatment decreases surface energy evaluated by the liquid drop method. Si-inclusion decreases the nanoindentation hardness. CF4 plasma treatment decreases nanoindentaion hardness of DLC film, however increases the hardness of 20% Si containing DLC film. Micro wear depth increases by Si-inclusion evaluated by nanoscratch test. CF4 plasma treatment increases the micro wear of DLC film, however decreases the micro wear of 20% silicon containing DLC film. Friction coefficients of both DLC and Si-DLC films were decreased by CF4 plasma treatment.
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