イオン注入材の電気化学的性質

Abstract

Application of ion implantation to the modification of the electrochemical properties of metals are reviewed. It has been observed that ion beam radiation, alloying, and chemical compound formation associated with an ion implantation influence the electrochemical reaction properties of metals. The anodic dissolution reaction of metals is an important process in corrosion, and its suppression by ion implantation is expected to be a useful modification for corrosion inhibition. The anodic dissolution of ion-implanted surface layers has been investigated by means of multisweep cyclic voltammetry. The ion implantation of metal ions, such as Cr+, Ti+, and Ta+, to form a passive surface layer has been found to be effective in the corrosion inhibition of iron substrates. The effect on corrosion behavior due to the amorphization associated with ion implantation has also been investigated, and B+-implantation was found to be effective in the amorphization of pure iron and martensitic stainless steel, but not in that of austenitic stainless steel. Modification of metal substrates, such as Ti, Al, Mg, Cr, Ag, has been studied from various points of view, and the formation of TiN by N+-implantation has been extensively studied because of its high hardness, wear reduction, gold color, and high corrosion resistance. In future, extremely high-dose implantation will be investigated as a means of forming surfaces offering new properties and functions.