Abstract
XPS or AES sputter depth profiling sometimes encounters difficulties with the materials that are damaged by ion bombardment. Therefore, it becomes difficult to determine precise chemical states of such materials. The damages of oxides by ion bombardment as observed in XPS spectra were reviewed. Spectrum changes are classified into three types; (1) additional peaks appear as a result of reduction for one type of the oxides, (2) the spectra are broadened for the second one, and (3) the third type oxides are not chemically changed. It is pointed out that these changes are related to the change of the enthalpy of atomization and ionicity. Secondly, the intensity changes as a function of sputtering time is formulated using reduction cross sections by the ion bombardment and sputtering yield.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
