アルゴンガスクラスターイオンビームと実用表面分析

Abstract

Argon Gas Cluster Ion Beam (Ar-GCIB) is now widely spread in the field of practical surface analysis, such as X-ray photoelectron spectroscopy (XPS) and Time-of-Flight secondary ion mass spectrometry (TOF-SIMS), because of its unique sputtering effect of low chemical degradation for organic materials. GCIB provides the lateral sputtering effect and the high sputtering yield of which are never achieved by monotonic Ar ion beam on organic materials, so that the low chemical degradation of organic materials with high depth resolution and high sputtering rate could be achieved. Of course, a study of the GCIB sputtering phenomena with chemically reactive gasses, instead of Ar gas, for the advanced materials is one of the interesting things from an academic point of view. But the Ar-GCIB technique is expected to use for more practical applications, especially in the industrial field. In this paper, some practical applications of Ar-GCIB with recent XPS and TOF-SIMS instruments will be briefly introduced.