Abstract
In order to clarify the influence of the W cathode in the hollow cathode discharge (HCD) method, straight-type W, W+Ta, and Ta cathodes were investigated using a horizontal-type high-current HCD apparatus, and HCD coating conditions and properties of TiN film with these cathodes were evaluated.(1) The life time of the W+Ta cathode during HCD plasma coating was 3-4 times as long as that of the Ta cathode.(2) Thin-film X-ray diffraction of TiN films using W and W+Ta cathodes manifested a stronger (111) peak of TiN than that of the Ta cathode.(3) Although no clear difference in the scanning electron microscopic observation of the TiN was observed, color monitoring of the TiN films with the W+Ta cathode showed a dark gold.
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