Abstract
Relation between pit morphologies and interfacial impedance characteristics was investigated on an aluminum foil with the (100) crystal orientation under a corrosion potential in 1mol•dm-3 hydrochloric acid solution. Effects of solution temperature, concentration of hydrochloric acid and addition of sulfuric acid on impedance parameters of charge transfer resistance, Rct, time constant, τ0 and reaction uniformity parameter, θ, were discussed. With increasing temperature and hydrochloric acid concentrations, the average of τ decreases and its distribution becomes wider. With addition of sulfuric acid, the average increases and the distribution becomes sharper. In this experiment, it is considered that τ0, which is the horizontal axis of distribution of reaction activity corresponds to the degree of aluminum dissolution, and the distribution density, which is the vertical axis corresponds to the surface uniformity. If we will choose such conditions that the τ0 value is below 1.0ms and the distribution density is below 0.7, etch pit sites are expected generated independently from each other without aggregation of many pit sites.
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