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Abstract
Potassium niobate thin films were prepared on amorphous (SrO-SiO2) layer/Si wafer by means of RF magnetron sputtering using a (KNbO3+ K2CO3) mixed powder target. Amorphous (SrO-SiO2) layers under the potassium niobate thin films were prepared by means of RF magnetron sputtering using a (SrCO3 + SiO2) mixed powder target. Crystallization and orientation of the potassium niobate thin films depended on (KNbO3 + K2CO3) target compositions and amorphous (SrO-SiO2) layer target compositions under the potassium niobate thin films. The orientation of potassium niobate thin films could be controlled by a favorable choice of (KNbO3 + K2CO3) target compositions and amorphous (SrO-SiO2) layer target compositions, and produced highly [110] oriented perovskite type potassium niobate thin films.
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