Abstract
A control design method to stabilize multivariable reactive sputter processes is developed. A new model is presented to describe the nonlinear deposition process with respect to the set argon gas flow, the set reactive gas flow and the generator power as the inputs. Outputs are the total pressure, the reactive gas pressure and the self-bias voltage. The control-oriented model is analyzed with regard to its static behavior and its stability properties. Based on this analysis, a novel design method for the process control is discussed. Experimental data illustrate the applicability of the developed control system to accomplish set-point following for the control loop despite the presence of uncertainties in the process parameters.
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