Multiscale modeling of CVD film growth—a review of recent works

Abstract

Multiscale modeling is a promising route towards the prediction of the microstructure and properties of materials prepared by chemical vapor deposition. The recent advances made in this field of investigation are briefly reviewed in this article. Some basic principles of multiscale modeling are first reminded and numerical simulation strategies are illustrated through a few selected examples, including deposition over patterned substrates and growth of carbon-based materials such as diamond and silicon carbide films and carbon nanotubes. Self-consistent approaches linking macroscopic reactor models and microscopic or atomic scale growth models are particularly emphasized. Actual limitations and future trends in multiscale modeling of film deposition or etching are finally discussed.