Abstract

We describe the evolution of ultrafast-laser-excited bulk fused silica over the entire relaxation range in one-dimensional geometries fixed by non-diffractive beams. Irradiation drives local embedded modifications of the refractive index in the form of index increase in densified glass or in the form of nanoscale voids. A dual spectroscopic and imaging investigation procedure is proposed, coupling electronic excitation and thermodynamic relaxation. Specific sub-ps and ns plasma decay times are respectively correlated to these index-related electronic and thermomechanical transformations. For the void formation stages, based on time-resolved spectral imaging, we first observe a dense transient plasma phase that departs from the case of a rarefied gas, and we indicate achievable temperatures in the excited matter in the 4,000–5,500 K range, extending for tens of ns. High-resolution speckle-free microscopy is then used to image optical signatures associated to structural transformations until the evolution stops. Multiscale imaging indicates characteristic timescales for plasma decay, heat diffusion, and void cavitation, pointing out key mechanisms of material transformation on the nanoscale in a range of processing conditions. If glass densification is driven by sub-ps electronic decay, for nanoscale structuring we advocate the passage through a long-living dense ionized phase that decomposes on tens of ns, triggering cavitation.

Highlights

  • We describe the evolution of ultrafast-laser-excited bulk fused silica over the entire relaxation range in one-dimensional geometries fixed by non-diffractive beams

  • Refractive index engineering using ultrafast laser radiation is at the base of the development of three dimensional optical circuits capable of transporting and manipulating l­ight[1,2]

  • Nanoscale features are for example useful to create read-out centers required to sample electrical fields in optical circuits or to generate strong optical resonances for Bragg s­ ensors[5,6,7], but they can serve as initiation centers for accurate cleavage of optical materials of technological i­mportance[8,9,10]

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Summary

Introduction

We describe the evolution of ultrafast-laser-excited bulk fused silica over the entire relaxation range in one-dimensional geometries fixed by non-diffractive beams. For the void formation stages, based on time-resolved spectral imaging, we first observe a dense transient plasma phase that departs from the case of a rarefied gas, and we indicate achievable temperatures in the excited matter in the 4,000–5,500 K range, extending for tens of ns. We discuss here full-range electronic and thermomechanical evolutions of a fused silica material under volume confined irradiation using ultrashort laser Bessel beams in conditions of the achievement of either type I positive refractive index changes or, at the opposite, the formation of nanoscale voids. Correlating spectral and imaging measurements, we provide a comprehensive view of electronic, thermodynamic and morphological material evolution for excited glassy matter in conditions of bulk confinement on multiple timescales, resulting on structuring at the nanoscale

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