Abstract
Simulations of reflection electron microscopy (REM) images of both monolayer and bilayer steps on the bulk-terminated Si(001) surface, for the case when the primary electron beam azimuth is directed parallel to the line of the step, are presented. The simulations employ our previously reported theory of REM image formation which uses a 2D Bloch wave formulation of dynamical (multiple scattering) elastic RHEED theory to calculate diffracted amplitudes propagating from the surface. The only step contrast mechanism considered here is phase contrast and this is sufficient to produce the characteristic “black-white” appearance observed experimentally. Defocusing of the simulated images is also discussed.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
