Abstract
A multiple internal reflection infrared monitoring system based on two-prism coupling geometry has been developed for the quantitative measurement of organic contamination on 200 or 300 mm silicon wafers. The method is rapid, simple, and can be carried out nondestructively. Varying the distance between the prisms couplers allows one to perform absolute infrared absorption measurements without the need of a reference wafer. On 300 mm silicon wafers CH2 and CH3 surface concentrations as low as 4×1012 cm−2 can be measured.
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