Abstract
We investigated the interaction processes between high intensity femtosecond ultraviolet laser pulses and amorphous silica, leading to permanent refractive-index changes that are at the basis of advanced manufacturing for photonics devices. The experiment, carried out as a function of the laser power, improves our understanding on the strong-field ionization process by the monitoring of the 1.9 eV and 2.65 eV emissions, related to nonbridging oxygen hole centers and self-trapped exciton, respectively, induced in the exposed glass region. Our results clearly proved that the UV laser light band-to-band absorption is allowed in the multiphoton ionization limit, whose consecutive relaxation leads to the generation of these photoluminescence (PL) signatures. Furthermore, we coupled the online PL investigation with post mortem analysis of the irradiated volume through phase contrast microscopy, Raman and steady state PL, providing a complete view of the silica-femtosecond laser interaction.
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