Abstract
In this work, wavelengths were determined for the robust and simultaneous measurement of film thickness, urea concentration and fluid temperature. Film parameters such as film thickness, film temperature and the composition of the film are typically dynamically and interdependently changing. To gain knowledge of these quantities, a measurement method is required that offers a high temporal resolution while being non-intrusive so as to not disturb the film as well as the process conditions. We propose the extension of the FMLAS method, which was previously validated for the film thickness measurement of thin liquid films, to determine temperatures and concentrations using an adapted evaluation approach.
Highlights
In many industrial applications, the formation of thin liquid films, whether it be desired or not, has a significant influence on the underlying processes
Film Thickness ness, The which set by thewas spacer ring, andwith the the calculated film value thicknesses are from represented filmisthickness determined absorbance extracted the test by the black crosses
With regard to of urea nation ofthe thin liquid urea–water film parameters of thickness, and concenin water, uncertainty of the mixing procedure that arises fromtemperature the measurement of the tration.and
Summary
The formation of thin liquid films, whether it be desired or not, has a significant influence on the underlying processes. Examples range from printing or coating processes [1,2] and lubrication purposes [3,4] to the formation of oil films on piston heads, causing pool fires and leading to an increase in pollutants in exhaust gas [5,6]. Another process where film formation has a high relevance is the selective catalytic reduction process (SCR), which is a state-of-the-art method to reduce nitrous oxides from the exhaust gas of diesel engines. Depending on the operation conditions, a liquid UWS film can form on the surrounding walls, which can subsequently form solid deposits
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