Multilayer thin-film capacitors fabricated by radio-frequency magnetron sputtering

Abstract

In this study, we fabricate multilayer ceramic capacitors (MLCCs) composed of BaTiO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> (BT) dielectric layers with Pt internal electrodes by radio frequency magnetron sputtering. We deposited BT layers with thickness of approximately 300 nm on Pt/Ti-coated SiO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> /Si substrates through a movable shadow mask. The isolated internal Pt electrodes are prepared by sliding the shadow mask. Multilayered BT thin films are uniformly deposited on a Si substrate with external electrodes on both sides of the BT films. The formation of a polycrystalline perovskite structure was confirmed by XRD measurement. The MLCCs with five BT layers exhibit excellent dielectric properties: a relative dielectric constant of approximately 320 and a dielectric loss of around 2% regardless of the number of dielectric layers.