Abstract

Multilayer thin-film filters from different materi al pairs with spectral windows within the wavelength range 7n < 60 nm were developed. Optical characteristics of samples in the extreme ultraviolet, visible, and IR spectrum ranges were studied. Ultrathin freestanding Zr/Si large-aperture filters with transparencies up to 76% at 7n = 13 nm were manufactured for projection lithography test benches; variations in their properties during long-term thermal loads were studied.

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