Abstract
AbstractX‐ray multilayer optics play a vital role in synchrotron optics due to their ability to generate constructive interference. These devices typically consist of several tens to hundreds of periods of alternating layers coated on a substrate. In contrast to single‐layer mirrors that reflect X‐rays within a specific energy range, multilayer optics can be tailored to achieve a high reflection over a broad energy spectrum. This is a sought‐after property for many beamlines and has led to the development of numerous new X‐ray applications and capabilities. This review highlights advances in multilayer optics, including fabrication techniques, layer structure design, material choice, and strategies to enhance performance. This is placed in the context of recent applications of such multilayers as monochromator and gratings, focusing devices, and polarizers. Current challenges and the future outlook within this field are also proposed. This comprehensive summary of a rapidly advancing field highlights recent achievements and is intended to promote practical applications in terms of the use of multilayer synchrotron optics.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
