Abstract

The optical nanostructures with high-integration have attracted considerable attentions in the function expansion for the organic light-emitting devices (OLEDs). However, these nanostructures are usually fabricated by hard brittle materials, such as Si, and applied as attached equipment into device system. The traditional integration strategy gradually cannot meet the requirement for ultrathin, high-flexibility and multifunction in the new generation OLEDs. In this work, the electron beam lithography (EBL) has been applied to integrated the optical nanostructures into metallic electrode, realizing the high functional integration into ultrathin OLEDs. After carefully designed the structured electrode, we have successfully integrated the function of charge injection, trapped photons extraction and light collimation into one. And this attempt may provide a feasible strategy for the fabrication of next-generation ultrathin and multifunctional photoelectric devices.

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