Abstract
A rapid and sensitive method for the determination of impurity elements in high purity tantalum metals is proposed. Tantalum metals were digested with nitric acid (HNO3) and hydrofluoric acid (HF). The digested sample solutions were injected into a flow injection system with a cation exchange column. Impurity elements adsorbed were eluted with the mixture of HNO3 and HF, and then the effluent was introduced into an ICP plasma with conventional pneumatic nebulization. In the present flow injection/ICP-MS system, the detection limits, based on 3 times the standard deviation of the blank, were in the range 0.03 - 6 ng/g for the 16 impurity elements (Li, Na, Mg, Mn, Co, Cu, Zn, Ga, Rb, Sr, Cd, In, Ba, Tl, Pb, and Bi).
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