Multicharged metallic ion production for accelerators (invited)

Abstract

Various methods of metal ion production are presented with respect to multiply charged ion production. Depending on the ion source one or the other method is more commonly used. PIG ion sources for high charge states use mostly the sputtering technique for metal ions. ECR ion sources use oven techniques or direct evaporation by the plasma and also chemical compounds. Mevva ion sources use the vacuum arc and laser ion sources the laser power for evaporation and simultaneously multiple ionizing the metal atoms. Design details will be discussed in connection with these ion sources.