Multichannel DFB Laser Arrays Fabricated by Upper SCH Layer SAG Technique

Abstract

Multiwavelength laser arrays (MWLAs) fabricated by a novel upper separate confinement heterostructure (SCH) layer selective area growth (SAG) technique are studied in comparison with laser arrays fabricated by the conventional multiquantum well (MQW) SAG technique. For MWLAs by the MQW SAG, the range of the laser emission of the array is smaller than the span of the PL wavelengths of the MQW active layers. In addition, the material quality of the MQW layer degrades greatly as the width of the SAG strips is increased. Thus, the MWLAs fabricated by the method have scattered L-I characters and large fluctuation of wavelength spacings. In contrast, the MWLAs fabricated by the novel SAG method have much better wavelength spacing uniformity than those by MQW SAG, which is comparable to or better than the MWLAs fabricated by E-beam direct writing. Furthermore, the upper SCH layer SAG technique is suitable for the fabrication of MWLAs with wavelength interval, which is a challenge even for E-beam technique. In the SCH layer SAG, the MQW layer is untouched, and the same is true for all the laser elements in an array. The metal organic vapor phase epitaxies ability to control the material properties with high accuracy can be fully utilized for the fabrication of MWLAs. Combined with partially gain-coupled distributed feedback structures, the technique is promising for the fabrication of low-cost, high-quality MWLAs.