Abstract
Two standardization techniques were implemented for transferring three multi-way calibration models for determining of the suppressor concentration in industrial copper electrometallization baths used in semiconductor manufacturing. Parallel Factor analysis (PARAFAC) for multi-way array decomposition coupled with Inverse Least Squares (ILS) (PARAFAC/ILS) regression, Direct Trilinear Decomposition (DTLD) coupled with ILS (DTLD/ILS), and Multi-linear Partial Least Squares (N-PLS) regressions were employed to develop and test calibration models based on trilinear Alternating Current (AC) voltammetric data. The calibration transfer was performed by Direct Standardization (DS) and Reverse Standardization (RS) on the voltammetric data. The pairwise performance of standardization techniques and decomposition/regression techniques was studied comparatively in order to assess reliability and robustness of analytical model transfer.
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