Multi-scale textured PEEK surfaces obtained by direct laser interference patterning using IR ultra-short pulses

Abstract

In this work, we aimed at getting the first insight into the influence of the laser processing parameters on the production of functional multi-scale PEEK surfaces using the Direct Laser Interference Patterning technology. An infrared ultra-short pulsed laser source (1064 nm, 10 ps) and a two-beam interference setup were used. The fabricated structures morphology was analyzed by Scanning Electron Microscopy and Confocal Microscopy. As a result, line-like structures with periodic spatial repetition (p) at two levels were produced: main structures with p = 5 µm and mean depth values up to ∼2.5 µm (aspect ratio of ∼0.5) and secondary structures, perpendicularly oriented relative to the main structures, formed at DLIP maxima position (top part of ridges) with p≈1 µm (LIPSS).