Abstract
Multilayer ZnS and Ag thin films at nano-scale thickness and different substrate temperatures were investigated. Deposition carried out by PVD method using electron beam depositing mode on Corning glass substrate at room temperature, 60, 100 and 150°C. The optical performance of single and multi layers were characterised by XRD, ellipsometry analysis and scanning probe microscopy. XRD justifies that the film is crystallised in the hexagonal and cubic structure. Ellipsometry spectroscopic analyses reveal that the interlayer between Ag and ZnS layers contains a physically mixed layer and a compound semiconductor layer. Based on the characteristic matrix theory, the optimised multilayer system was speculated and tested. An optimised structure with good heat mirror performance was successfully prepared, including some new extremely asymmetric multilayer structures. Morphological characterisations carried out by scanning probe microscopy on the AFM mode to study the particle size, packing and roughness of the films.
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