Abstract

BiVO4 with an appropriate band structure is considered to be an ideal candidate for photoanodes. However, slow water oxidation kinetics and low charge separation efficiency seriously restrict its application. To address these issues, an NF/N/BVO photoanode with a hierarchical network structure was successfully constructed by direct-current magnetron sputtering of Ni followed by electrochemical deposition of nickel-iron layered double hydroxide (NiFe-LDH) on BiVO4. A photocurrent density of 4.50 mA/cm2 was obtained for NF/N/BVO, which was 2.4 times that for pristine BiVO4. The introduction of the Ni layer contributed to the following growth of NiFe-LDH nanosheets with larger size, which acted as active sites and speeded up water oxidation kinetics. Furthermore, surface photovoltage microscopy revealed that Ni and NiFe-LDH acted as the electron collector and hole reservoir, respectively. The co-existence of the two components constituted a highly efficient surface charge separation structure, which was one of the important issues for the excellent water oxidation activity.

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