Abstract
This paper presents a method of utilizing a non-contact position sensor for the tilting and movement control of a rotor in a rotary magnetic levitation motor system. This system has been studied with the aim of having a relatively simple and highly clean alternative application compared to the spin coater used in the photoresist coating process in the semiconductor wafer process. To eliminate system wear and dust problems, a shaft-and-bearing-free magnetic levitation motor system was designed and a minimal non-contact position sensor was placed. An algorithm capable of preventing derailment and precise movement control by applying only control without additional mechanical devices to this magnetic levitation system was proposed. The proposed algorithm was verified through simulations and experiments, and the validity of the algorithm was verified by deriving a precision control result suitable for the movement control command in units of 0.1 mm at 50 rpm rotation drive.
Highlights
Among the semiconductor technologies that are being actively researched recently, semiconductor process technology is one of the core technologies of the semiconductor industry
In spin coater machines, a rotating mechanical system used in the photoresist coating process during the wafer process, problems such as dust are a major cause of defective products
It is an eco-friendly and simplified system that can take over the role of an additional nozzle position control system by removing the dust generation problem and performing movement control in the semiconductor wafer process, the application field of this study
Summary
Among the semiconductor technologies that are being actively researched recently, semiconductor process technology is one of the core technologies of the semiconductor industry. In spin coater machines, a rotating mechanical system used in the photoresist coating process during the wafer process, problems such as dust are a major cause of defective products. In the case of general magnetic levitation system research, a tilting system is added to prevent derailment to stably and independently drive the levitation target. Since it is a system using magnetic levitation, it can solve the problems of mechanical wear and dust, 4.0/). The magnetic levitation spin coater system was designed to solve the dust problem of the spin coater system, an electric system used in the semiconductor coating process, and to simplify the additional nozzle position control system. By verifying the validity of the proposed algorithm based on simulation and test results, it will be possible to greatly improve the problems of dust and system complexity in the semiconductor manufacturing process industry
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