Abstract
We observed the regular morphology evolution of chemical vapor deposition (CVD) grown MoS2 nanorods along the gas flow direction on the SiO2/Si substrate. It can be attributed to the concentration gradient of the gas phase MoO3 along the gas flow direction, which impacts the average growing rate of the MoS2 crystals. The MoS2 domains experience a regular morphology transformation as well as a size change as the deposition location moves closer to the MoO3 powder. It paves the way for the development of CVD method with controlled growth parameters and opens up new venues for the tunable morphology evolution of MoS2 nanorods.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
