Abstract
We studied the morphology evolution of asymmetric diblock copolymer poly (styrene-b-methyl methacrylate) P(S-b-MMA) films as a function of film thickness and annealing time on Si /native oxide substrate. We also investigated other factors affecting the morphology in addition to film thickness and annealing time, such as substrate cleaning procedures. Ion etching was employed to probe the structure inside the films. The obtained results confirm that there is a range of thicknesses where perpendicular cylinder orientation is obtained on a preferential surface, in agreement with theoretical predictions.
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