Abstract
We studied the morphology evolution of asymmetric diblock copolymer poly (styrene-b-methyl methacrylate) P(S-b-MMA) films as a function of film thickness and annealing time on Si /native oxide substrate. We also investigated other factors affecting the morphology in addition to film thickness and annealing time, such as substrate cleaning procedures. Ion etching was employed to probe the structure inside the films. The obtained results confirm that there is a range of thicknesses where perpendicular cylinder orientation is obtained on a preferential surface, in agreement with theoretical predictions.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
