Abstract
A novel technology (co-sputtering oblique angle deposition) was used for fabricating W-doped Bi2O3 films. After further annealing at 500 °C, the surface morphologies and microstructures of the films were characterized by scanning electron microscopy and X-ray diffraction. With increase in the sputtering current of W target in co-sputtering process, the surface morphology of W-doped Bi2O3 films changed significantly. The mechanism of morphology evolution was systematically studied. The optical properties of W-doped Bi2O3 films such as band gap and photocatalytic performance were also investigated. The results indicate that this co-sputtering oblique angle deposition technology is a promising new method for investigating the nanostructures photocatalytic and other performance of doped materials.
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