Abstract
Fluidized chemical vapor deposition (FCVD) technology was developed for coating SnO2 thin film on ultrafine Al2O3 particles. Transmission electron microscopy (TEM) and high-resolution electron microscopy (HREM) analyses demonstrated that SnO2 films with different structures were deposited through controlling the coating temperature, reactant concentration, etc.. Nanocrystalline SnO2 film was formed at 572.15K by gas phase reaction of SnCl4 and H2O. Electron probe microanalyser (EPMA) and energy dispersive spectrometer (EDS) analyses indicated that the distribution of nanocrystalline SnO2 over inner and outer part of the Al2O3 agglomerates was homogeneous.
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