Abstract
We examined the Si(001) surface after immersion in a mixture of ultrapure water and silica powder particles by atomic force microscopy (AFM), spectroscopic ellipsometry and electron spectroscopy for chemical analysis (ESCA). The surface etching of Si(001) in the mixture fluid is found to be markedly suppressed, although the surface etching of Si(001) under aqueous conditions proceeds constantly. The surface microroughness after immersion in the mixture fluid can be maintained in the state it was in before immersion. It is suggested that the existence of silica powder particles in the ultrapure water affects the stability of the Si(001) surface morphology.
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