Abstract
The morphological properties of poly[methyl(H)silane-co-diphenylsilane] copolymer (PSH) under XeCl (308 nm) laser irradiation were investigated. For this purpose, PSH films were exposed to XeCl excimer laser, 308 nm, at various UV doses (122 and 366 mJ/cm2), with 11 and 33 mJ/pulse and 1 Hz pulse repetition rate. The morphology of the PSH film surface was investigated by the atomic force microscopy (AFM) technique. AFM identifies that the films of the copolymer form a wormlike morphology before irradiation and conical defects are created on the polymer surface and grow with the laser irradiation.
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