Abstract
The interaction of NH 3 in the 10 −2–10 2 langmuir exposure range with different Si surfaces, namely (111)2 × 1 and 7 × 7 reconstructed as well as (100) 2 × 1 either stepped or not, is compared. Upon saturation, characterized by a removal of the surface dangling bonds (DB) and a net decrease of the ionization energy, Si(111) 7 × 7 differs from other surfaces in saturating at one NH 3 molecule per 2 DB against 4 for the others. The various results are explained within a common picture where the NH 3 molecule dissociates into one NH 2 radical and one hydrogen atom, each species being able to remove 2 DB, if they are close enough.
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