Abstract
SummaryNowadays, there is a great interest in designing and fabricating thin films with unique morphologies to improve the surface properties for various applications. In this regard, atomic force microscopy (AFM) is widely used to investigate the surface morphology of thin films. The high spatial and vertical resolution makes AFM capable of extracting surface micro‐roughness information precisely. In this study, films were deposited on different substrates using the RF‐PECVD method. The morphological properties were studied by AFM analysis according to ISO 25178‐2: 2012.The results of analyzing the AFM data demonstrate that a copper substrate is a good option for the fabricated silver film in this study, and it is a relatively ideal surface in terms of fractality.
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