Morphological and Structural Characterization of YSZ Thin Film Fabricated by Electrophoretic Deposition on LSM/YSZ Substrate

Abstract

YSZ film was fabricated by a facile electrophoretic deposition process using commercial YSZ powders. YSZ films with average thickness of around 10 µm were deposited on LSM/YSZ substrate at 20 V for 20 minutes and subsequently sintered at 1200 °C, 1300 °C, and 1350°C. XRD patterns of the deposited and sintered films can be attributed to mostly cubic YSZ phase. On the other hand, SEM images revealed that a sintering temperature above 1300 °C was needed to obtain a denser YSZ film. The film morphology also showed that as the sintering temperature increases, the YSZ grain size also increases.