Abstract

Periodically arranged, selforganised, nanometric, amorphous precipitates have been observed after high-fluence ion implantations into solids for a number of ion/target combinations at certain implantation conditions. A model describing the ordering process based on compressive stress exerted by the amorphous inclusions as a result of the density change upon amorphisation is introduced. A Monte Carlo simulation code, which focuses on high-fluence carbon implantations into silicon, is able to reproduce experimentally observed nanolamella distributions as well as the formation of continuous amorphous layers. By means of simulation, the selforganisation process becomes traceable and detailed information about the compositional and structural state during the ordering process is obtained. Based on simulation results, a recipe is proposed for producing broad distributions of ordered lamellar structures.

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