Abstract
Reentrant behavior of intensity oscillation of reflection high-energy electron diffraction (RHEED) observed during low-temperature GaAs homoepitaxy on GaAs (001) substrates is studied by a Monte Carlo simulation using cubic solid-on-solid configuration. By assuming that an excess As overlayer acts as surfactant which enhances the migration of Ga adatoms at low temperature, temperature as well as V/III ratio dependence of step density oscillation (i.e., RHEED intensity oscillation) is successfully reproduced.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
