Monte Carlo simulation of incident electrons passing through thin metal layer

Abstract

A Monte Carlo simulation using two schemes, the discrete energy loss approach and the continuous slowing down approximation, was implemented in C++ to calculate the energy transmission coefficient and average energy loss for low-energy (1–10 keV) incident electrons passing through a thin metal layer. The simulation model uses the Ashley model for electron inelastic scattering, the electron elastic scattering cross section taken from the NIST database, and the stopping power derived from the full Penn algorithm. The results of the two schemes agree well with each other and can be used to quantitatively evaluate the shielding effect of a thin coated metal layer on incident electrons for a diamond amplified photocathode.