Monte Carlo electron trajectory simulation of x-ray emission from films supported on substrates

Abstract

Monte Carlo electron trajectory simulation provides a powerful tool for theoretical studies of electron/x-ray interactions in solid targets. The great power of a Monte Carlo technique arises from the stepwise treatment of the electron trajectory in the target, which provides the capability of dealing with unusual geometric boundary conditions which differ from the ideal of a flat, polished, semiinfinite slab. Special targets, such as randomly tilted surfaces, particles, thin foils, and films supported on substrates, can be simulated by a Monte Carlo procedure.It is proper to speak of “a” rather than “the” Monte Carlo procedure because there is no single formulation of the simulation in universal use. A variety of choices exists for the treatment of the scattering and energy loss processes. In particular, the approach to simulating inelastic scattering varies widely. While most calculations consider inelastic scattering by means of a continuous energy loss approximation rather than by modeling the discrete inelastic processes, there are now several different choices proposed for the treatment of energy loss in the low energy range (<3 keV) where the Bethe model proves inadequate.