Monolithic integration of an InGaAsP–InP strained DFB laser and an electroabsorption modulator by ultra-low-pressure selective-area-growth MOCVD

Abstract

The design and basic characteristics of a strained InGaAsP–InP multiple-quantum-well (MQW) DFB laser monolithically integrated with an electroabsorption modulator (EAM) by ultra-low-pressure (22 mbar) selective-area-growth (SAG) MOCVD are presented. A fundamental study of the controllability and the applicability of band-gap energy by using the SAG method is performed. A large band-gap photoluminescence wavelength shift of 88 nm was obtained with a small mask width variation (0–30 µm). The technique is then applied to fabricate a high performance strained MQW EAM integrated with a DFB laser. The threshold current of 26 mA at CW operation of the device with DFB laser length of 300 µm and EAM length of 150 µm has been realized at a modulator bias of 0 V. The devices also exhibit 15 dB on/off ratio at an applied bias voltage of 5 V.