Abstract
Properties of extreme ultraviolet (EUV) emission from laser-produced Sn and SnO2 plasmas were investigated. EUV emission images were taken with a monochromatic imager for 13.5nm with 4% bandwidth. It was found that the EUV emitting plasma is not formed symmetrically with respect to the target surface normal but extends toward laser incident axis. This result is consistent with the angular distribution of EUV emission peaked toward the direction nearly perpendicular to the laser axis. The asymmetric plasma can be attributed to the interaction of a long laser pulse with expanding plasma along the path of laser incidence.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
