Monitoring the Process of Nanocavity Formation on a Monomolecular Level

Abstract

Abstract Controlling the synthesis of nanostructured surfaces is essential to tailor the properties of functional materials such as catalysts. We report on the synthesis of nanocavities of 1–2 nm dimension on planar Si-wafers by sacrificial nanotemplating and atomic layer deposition (ALD). It is shown that the process of nanocavity formation can be directly monitored on a monomolecular level through imaging with an atomic force microscope (AFM). In particular, by employing the AFM peak force tapping mode the simultaneous mapping of surface topography and tip-surface adhesion forces is accessible, which is useful for the assignment of topographical features and determining the orientation of the template molecules on the wafer surface. Detailed analysis based on the three-dimensional AFM topography allows for a quantification of the template and nanocavity surface coverage. The results are of importance for a detailed understanding of the processes underlying template-based nanocavity formation on oxide surfaces.