Abstract
Molybdenum (Mo) commonly serves as an electrode layer for the highly columnar growth of AlN piezoelectric thin films used to fabricate film bulk/surface acoustic resonators. The structure of the bottom Mo electrode directly influences the texture of the top AlN thin film, whereas the surface morphology and texture of the Mo electrode are inversely influenced by the substrate materials. In this study, the effects of different underlays on the characteristics of Mo films deposited through RF magnetron sputtering are compared. The results show that Mo thin film deposited on SiO2 has well-textured crystallization and a small residual stress of 95MPa. Mo deposited on amorphous Si (α-Si)/SiO2 has the smallest surface roughness of 1.63nm, but its columnar texture is slightly tilted to the substrate. Mo thin film deposited on Si (111) shows relatively moderate characteristics compared with the other two thin films.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
