Abstract
AbstractA novel ionization method, electrospray droplet impact (EDI), has been developed for matrix‐free SIMS. The charged water droplets used in EDI are extremely large cluster ions with masses of about a few 106 u. When the charged water droplets impact on a target, the physical sputtering of the target is suppressed to minimal and an atomic‐and molecular‐level layer‐by‐layer etching is realized. Copyright © 2008 John Wiley & Sons, Ltd.
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