Molecular H 2 and H 3 energy loss measurements along the Si 〈111〉 direction

Abstract

In the present contribution we present results on molecular H 2 and H 3 energy loss measurements in the 〈1 1 1〉 Si direction by using Rutherford backscattering/channeling spectrometry and a SIMOX target. With this aim, we have used atomic and molecular H 2 and H 3 beams with energies of 250, 400 and 800 keV/atom. From the present results it was determined that the H 2 molecular stopping is larger than the atomic one. Moreover, our measurements show that the H 3 stopping is of the order of the H 2 one. In addition we have determined that the coherent distances of the H 2 clusters vary between 20 and 33 nm.