Abstract
Diffraction-intensity oscillations have been observed using molecular-dynamics simulations of vapor deposition. Atoms interacting via modified Lennard-Jones potentials were deposited onto fcc(111) and fcc(100) surfaces with periodic boundary conditions and the diffraction was calculated during growth. The oscillations increased in amplitude with increasing temperature and, in some cases, with reduced deposition rate. Larger oscillations were observed on the fcc(100) surface than the fcc(111) surface. Strong reentrant oscillations, observed earlier experimentally, were not observed.
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