Abstract

Evaporation of a thin liquid film is of significant fundamental importance for both science and engineering applications. This work investigates the evaporation of a thin liquid argon layer into vacuum employing molecular dynamics simulation based on the Lennard-Jones potential. The simulation results demonstrate that the net evaporation rate of an ultra-thin liquid film into vacuum in a closed system may be modeled by the balance of evaporation and condensation based on the Schrage model. The evaporation/condensation coefficient and the non-Maxwellian factor may thus be evaluated. As for the open system, the simulation results demonstrate a constant evaporation rate for each leakage probability. The corresponding evaporation heat transfer coefficient is very high and increases with increase in leakage percentage. Such a high heat transfer coefficient demonstrates very high heat transfer capability of evaporation from an ultra-thin liquid film. This work was supported by the National Science Council of Taiwan, ROC, under the contract of NSC90-2212-E-007-103. The computer program employed in this work was modified from the basic code developed by Professor S. Maruyama of the Department of Mechanical Engineering, the University of Tokyo. The authors would also like to acknowledge the valuable discussion with Dr. M.H. Hsieh of the Institute of Nuclear Energy Research, Taiwan, ROC. The program was executed using the supercomputers provided by the National Center for High-Performance Computing, Taiwan, ROC. This manuscript was rewritten based on authors' papers presented in the ASME Summer Heat Transfer Conference, Las Vegas, 2003, for closed system simulations and some results from the First International Symposium on Micro & Nano Technology, Hawaii, 2004, for open system simulations.

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