Abstract
Ion plasma deposition with simultaneous ion bombardment is one of the most promising techniques to improve the structure and properties of coatings. These effects are strongly dependent on the ion irradiation characteristics (current density, energy, etc.). A program based on molecular dynamics simulation has been developed to model ion assisted deposition. The model predicts film surface smoothing, improvement of stoichiometry, and some other effects which are discussed and compared with the experimental data.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Paper version not known
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
